Title:
化学増幅ポジ型レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4475372
Kind Code:
B2
Inventors:
Takanobu Takeda
Jun Watanabe
Katsuya Takemura
Kenji Koizumi
Jun Watanabe
Katsuya Takemura
Kenji Koizumi
Application Number:
JP2001075477A
Publication Date:
June 09, 2010
Filing Date:
March 16, 2001
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/039; C07C43/15; C07C43/17; C07C43/188; C07C43/205; C08F2/44; C08F291/06; G03F7/004; G03F7/40; H01L21/027
Domestic Patent References:
| JP10031310A | ||||
| JP2000029218A | ||||
| JP2001081137A |
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa
Yuko Nishikawa