Title:
化学増幅ポジ型レジスト材料及びこれを用いたパターン形成方法
Document Type and Number:
Japanese Patent JP4557159
Kind Code:
B2
Abstract:
A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high sensitivity, a high contrast of dissolution of resist film, a high resolution, and good storage stability.
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Inventors:
Ryuji Koitabashi
Satoshi Watanabe
Yoichi Osawa
Satoshi Watanabe
Yoichi Osawa
Application Number:
JP2005113115A
Publication Date:
October 06, 2010
Filing Date:
April 11, 2005
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/004; C07C309/31; C07C381/12; C07D327/08; C08F212/14; C08F220/10; G03C1/492; G03F7/039; H01L21/027
Domestic Patent References:
| JP2004271629A | ||||
| JP2005275283A | ||||
| JP2003114523A | ||||
| JP2005091712A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa