CHEMICALLY AMPLIFIED POSITIVE TYPE RESIST COMPOSITION AND SULFONATE

Japanese Patent JP3899771

B2

PROBLEM TO BE SOLVED: To provide a chemically amplified positive type resist composition which shows good properties such as sensitivity, resolution, adhesion to a sub strate and the like and shows less dependence on the substrate to give a good profile even when it is applied to the basic substrate or a low reflection sub strate.
SOLUTION: A chemically amplified positive type resist composition contains a resin and an acid generating agent wherein the resin which has a polymerization unit possessing an acid-unstable group is insoluble or hardly soluble in an alkali but becomes soluble in the alkali by a contact with an acid and the acid generating agent is a combination of a salt represented by formula (I) with at least one selected from salts represented by formulas (IIa) and (IIb) or a sulfonate represented by formula (I) wherein m is 4 to 8 (wherein Q1 is an alkyl group: Q2 is an alkyl or alicyclic hydrocarbon residual group; m is an integer of 1 to 8; Q3, Q4, Q5, Q6 and Q7 are each independently hydrogen, a hydroxyl group, an 1 to 6C alkyl or alkoxy group; and p and q are each integers of 4 to 8).

Yasunori Uetani
Hiroki Inoue
Kenji Ohashi

JP2000060057A

March 28, 2007

March 06, 2000

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Sumitomo Chemical Co., Ltd.

C08L101/00; G03F7/004; C08F2/46; C08F220/18; C08F220/26; C08F222/04; C08F232/04; C08K5/375; G03F7/039; H01L21/027; (IPC1-7): C08L101/00; C08K5/375; G03F7/004; G03F7/039; H01L21/027; //C08F2/46; C08F220/18; C08F220/26; C08F222/04; C08F232/04

JP11072917A
JP8027102A
JP7028237A
JP7025846A

Takashi Kuboyama
Toru Nakayama

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