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Title:
引っ込んだ支持特徴部を有するチャッキングシステム
Document Type and Number:
Japanese Patent JP5793140
Kind Code:
B2
Abstract:
In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.

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Inventors:
Gana Passis Bramanian, Mahadevan
Maysle, Mario, Johannes
Panga, Avinash
Choi, Byung-jin
Application Number:
JP2012517505A
Publication Date:
October 14, 2015
Filing Date:
July 02, 2010
Export Citation:
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Assignee:
Molecular Imprints Incorporated
International Classes:
B29C33/30; H01L21/027; B29C59/02
Domestic Patent References:
JP2001185607A
JP2006510223A
Foreign References:
WO2007126767A2
Attorney, Agent or Firm:
Masaki Yamakawa
Shigeki Yamakawa



 
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