Title:
CIS-1,4-POLYDIENES WITH IMPROVED COLD FLOW RESISTANCE
Document Type and Number:
Japanese Patent JP2020189995
Kind Code:
A
Abstract:
To provide a method for preparing cis-1,4-polydienes having useful resistance to the cold flow.SOLUTION: The method comprises the steps of: (i) preparing a polymerization system including a reactive polymer by introducing a lanthanide-based catalyst and a conjugated diene monomer; and (ii) adding a Lewis acid to the polymerization system including the reactive polymer after the polymerization system reaches the peak polymerization temperature. The Lewis acid is selected from the group consisting of titanium tetraalkoxides, boron trifluoride, trihydrocarbyl boranes, trihydrocarbyloxy borates, trihydrocarbylsilyl halides, trihydrocarbylsilyl triflates, titanium tetrahalides, aluminum trihalides, and zinc dihalides.SELECTED DRAWING: None
Inventors:
JOSHUA S DICKSTEIN
Application Number:
JP2020136832A
Publication Date:
November 26, 2020
Filing Date:
August 13, 2020
Export Citation:
Assignee:
BRIDGESTONE CORP
International Classes:
C08F236/04; C08F4/54
Domestic Patent References:
| JP2006503935A | 2006-02-02 | |||
| JP2010209255A | 2010-09-24 |
Foreign References:
| US20040102589A1 | 2004-05-27 |
Attorney, Agent or Firm:
Tamotsu Otani