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Title:
CLEAN ROOM STRUCTURE FOR ASSEMBLY PROCESS OF PROJECTOR
Document Type and Number:
Japanese Patent JP2007248033
Kind Code:
A
Abstract:

To provide a clean room structure used in an assembly process of a projector, capable of being rapidly installed in response to a market request, and of preventing inflow of contaminated air into a clean room from a pre-cleanroom.

In this clean room structure 10 for an assembly process of a projector, the clean room 20 has a blower device 22A or the like for supplying air into the clean room 20 by positively introducing the air from the outside and removing foreign matter, and an exhaust device 24 for exhausting air more than the blast amount of the blower device 22A or the like; the pre-cleanroom 40 has a first air passage 44 having a first filter 44a for introducing air from the outside by an atmospheric pressure difference from the outside and removing foreign matter; and a second air passage 28 for freely passing the air between the clean room 20 and the pre-cleanroom 40 is arranged in the vicinity of the first air passage 44.

COPYRIGHT: (C)2007,JPO&INPIT


Inventors:
IAN BIN
Application Number:
JP2006077682A
Publication Date:
September 27, 2007
Filing Date:
March 20, 2006
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
F24F7/06; F24F9/00
Attorney, Agent or Firm:
Masahiko Ueyanagi
Osamu Suzawa



 
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