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Patent Searching and Data


Title:
CLEANING AGENT COMPOSITION
Document Type and Number:
Japanese Patent JPH08245982
Kind Code:
A
Abstract:

PURPOSE: To provide a cleaning agent composition containing a secondary amide type N-acyltaurine salt and an amphoteric surfactant, having a low irritation to skin and hair, excellent in foaming and rinsing properties and capable of giving a preferable feeling after cleaning.

CONSTITUTION: This composition contains (A) a secondary amide type N- acyltaurine salt of the formula, RCONHCH2CH2SO3M (RCO is a C10-16 straight- chain acyl; M is Na, K or an alkanol ammonium), and (B) a betaine type amphoteric surfactant (preferable example; a coconut oil alkyldimethylaminoacetic acid betaine, or laurylhydroxysulfobetaine) in an weight ratio of A/B of 100/1 to 2/1 (preferably 50/1 to 5/1), more preferably contains the components (A) and (B) and (C) a higher fatty acid salt such as sodium laurate in an weight ratio of component C/components A+B of 1/20 to 1/2 (preferably 1/10 to 1/3). In addition, it is preferable that total blend amount of the compounds A and B is 5 to 50wt.%, 15 to 70wt.%, and 40 to 95wt.% in the cases of liquid, paste type and solid cleaning agents, respectively.


Inventors:
HORIBATA TOMOKO
KAMASHITA TOMOKO
WADA MASARU
NAGATA TERUYUKI
Application Number:
JP5230895A
Publication Date:
September 24, 1996
Filing Date:
March 13, 1995
Export Citation:
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Assignee:
MITSUI TOATSU CHEMICALS
International Classes:
A61K8/30; A61K8/00; A61K8/36; A61K8/40; A61K8/46; A61Q5/02; A61Q19/10; C11D1/28; C11D1/90; C11D1/92; (IPC1-7): C11D1/28; A61K7/075; A61K7/50; C11D1/90; C11D1/92