Title:
CLEANING APPARATUS FOR WASTE PROCESSING SYSTEM
Document Type and Number:
Japanese Patent JP2002188803
Kind Code:
A
Abstract:
To further reduce the number of constituting apparatuses of a waste processing system than that of a conventional type.
After a cleaning apparatus 3 causes decomposed gas from a condenser 3 to make direct contact with cleaning liquid 13, the cracked gas is fed to an off gas treating device. The cleaning liquid 13 dissolves chlorine gas and has nature to prevent the occurrence of a backfire from the off gas treating device.
Inventors:
TSUTSUMI RIKUO
OMACHI SHINSUKE
HAYASHI SHIZUO
KIDA KIYONORI
KOSHIBA KAZUYOSHI
MIYAMOTO MASAHIRO
WADA KIYOMI
OMACHI SHINSUKE
HAYASHI SHIZUO
KIDA KIYONORI
KOSHIBA KAZUYOSHI
MIYAMOTO MASAHIRO
WADA KIYOMI
Application Number:
JP2000384680A
Publication Date:
July 05, 2002
Filing Date:
December 19, 2000
Export Citation:
Assignee:
FUJI ELECTRIC CO LTD
International Classes:
F23G5/027; B01D53/34; B01D53/77; F23G5/14; F23J15/02; (IPC1-7): F23G5/027; B01D53/34; B01D53/77; F23G5/14
Attorney, Agent or Firm:
Shoji Shinobe
Previous Patent: GAS COOKING APPARATUS
Next Patent: FLUIDIZED BED LOW TEMPERATURE COMBUSTION METHOD AND LOW TEMPERATURE COMBUSTION DEVICE FOR WASTE
Next Patent: FLUIDIZED BED LOW TEMPERATURE COMBUSTION METHOD AND LOW TEMPERATURE COMBUSTION DEVICE FOR WASTE