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Title:
洗浄装置および洗浄装置の作動方法
Document Type and Number:
Japanese Patent JP6993932
Kind Code:
B2
Abstract:
To reduce a waste amount of a solvent while preventing reattachment of stain on a cleaning object.SOLUTION: A cleaning device 1 includes: two or more cleaning tanks which includes a first cleaning tank 11 and a second cleaning tank 12 positioned on an upstream side than the first cleaning tank; a cleaning liquid reproduction part 20 which reproduces a cleaning liquid supplied from the cleaning tanks and supplies to the cleaning tanks; piping 52 which connects the cleaning liquid reproduction part, and the first cleaning tank and the second cleaning tank; and a controller 30 which controls a flow of the cleaning liquid in the cleaning liquid reproduction part and the piping. The cleaning liquid reproduction part has two operation modes of a concentrating mode in which stain contained in the cleaning liquid is concentrated, and a normal mode without concentration. The controller controls the flow of the cleaning liquid in the piping so that the reproduced cleaning liquid is delivered to the second cleaning tank in the normal mode, and controls the flow of the cleaning liquid in the piping so that the reproduced cleaning liquid is delivered to the first cleaning tank in the concentrating mode.SELECTED DRAWING: Figure 1

Inventors:
Motohiro Atsumi
Kenichi Sakamoto
Application Number:
JP2018114581A
Publication Date:
January 14, 2022
Filing Date:
June 15, 2018
Export Citation:
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Assignee:
Olympus Endo Technology America Inc.
International Classes:
B08B3/04
Domestic Patent References:
JP4225875A
JP2002018370A
JP2001314828A
JP3249983A
JP6306664A
JP5161882A
JP6134444A
Attorney, Agent or Firm:
Sumio Tanai
Mitsuyoshi Suzuki
Tadao Takashiba
Shiro Suzuki



 
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