Title:
CLEANING LIQUID FOR FINE UNEVEN STRUCTURE
Document Type and Number:
Japanese Patent JP2016210869
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide cleaning liquid which is excellent in removing properties of stains and safety and is for use in removal of stains from a fine uneven structure having a period equal to or shorter than the wavelength of visible light.SOLUTION: In a first embodiment, the cleaning liquid is provided which is for use in cleaning of a fine uneven structure 10 composed of: fine uneven structure composed of an active energy ray-curable resin composition; and a transparent base material supporting the fine uneven structure, and in which the cleaning liquid is a weak basic aqueous solution. In a second embodiment, the cleaning liquid is provided which is identical to the cleaning liquid in the first embodiment except that a pH of the aqueous solution is 8 to 10.SELECTED DRAWING: Figure 1
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Inventors:
ONOMOTO HIROSHI
Application Number:
JP2015094618A
Publication Date:
December 15, 2016
Filing Date:
May 07, 2015
Export Citation:
Assignee:
MITSUBISHI RAYON CO
International Classes:
C11D17/08; C11D7/12; G02B1/118