Title:
洗浄処理装置
Document Type and Number:
Japanese Patent JP4047406
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To prevent the reverse transfer of the foreign matter removed by a washing brush to wash by washing the wash by swiveling and vertically moving the washing brush, then bringing this washing brush into contact with the wash. SOLUTION: A semiconductor wafer 22 is held in a rotary chuck 11 of a spin treatment device A and a horizontal arm 33 is swiveled and positioned upward of this spin treatment device A. While the washing brush of a washing rail 31 is rotated, a washing liquid is injected. Simultaneously, the horizontal arm 33 is lowered to bring the washing brush into contact with the front surface of the semiconductor wafer 22. The horizontal arm 33 is moved back and forth in this state in the diametral direction of the semiconductor wafer 22 and the washing is executed by rotating the rotary chuck 1 at a low speed. The horizontal arm 33 is risen and swiveled like alternate long and two short dashes lines to bring the washing brush into contact with the perforated section 67 in a washing tank 61 to get rid of the foreign matter sticking to the washing brush, by which the reverse transfer of the foreign matter to the wash is prevented.
Inventors:
Sadaaki Kurokawa
Naoaki Sakurai
Naoaki Sakurai
Application Number:
JP30471396A
Publication Date:
February 13, 2008
Filing Date:
November 15, 1996
Export Citation:
Assignee:
Shibaura Mechatronics Co., Ltd.
Toshiba Corporation
Toshiba Corporation
International Classes:
B08B7/04; B08B1/04; B08B3/12; H01L21/304
Domestic Patent References:
| JP8039014A | ||||
| JP3025234U | ||||
| JP7171515A | ||||
| JP2109333A | ||||
| JP63016626A |
Attorney, Agent or Firm:
Takehiko Suzue
Sadao Muramatsu
Ryo Hashimoto
Satoshi Kono
Makoto Nakamura
Shoji Kawai
Sadao Muramatsu
Ryo Hashimoto
Satoshi Kono
Makoto Nakamura
Shoji Kawai