Title:
CLEANING TOOL, CLEANING METHOD, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING DEVICE
Document Type and Number:
Japanese Patent JP2012109359
Kind Code:
A
Abstract:
To provide a cleaning tool which can minimize occurrence of poor exposure.
The cleaning tool 40 is carried in an exposure device which exposes a substrate with exposure light emitted from the emission surface of an optical member, and cleans at least a part of the exposure device. The cleaning tool 40 has a capturing part 42 capable of capturing a foreign matter, and cleans at least a part of a certain member in a state where the cleaning tool 40 is held by a holding part 31 so that the upper surface of the capturing part 42 faces, through a predetermined gap, the lower surface of the certain member of the exposure device which a substrate stage 2, having the holding part 31 for holding the substrate releasably, can face.
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Inventors:
NAKANO KATSUSHI
NISHII YASUFUMI
NISHII YASUFUMI
Application Number:
JP2010256223A
Publication Date:
June 07, 2012
Filing Date:
November 16, 2010
Export Citation:
Assignee:
NIKON CORP
International Classes:
H01L21/027; G03F7/20
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Kazuya Nishi
Tadashi Takahashi
Kazuya Nishi
Previous Patent: JP2012109358
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