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Patent Searching and Data


Title:
CLOTH FOR STERIC PLANTATION AND STERIC PLANTATION METHOD
Document Type and Number:
Japanese Patent JP2000300081
Kind Code:
A
Abstract:

To provide a cloth for steric plantation capable of sterically planting grasses and flowers to easily decorate a veranda, outer wall or room.

The objective cloth is a woven fabric 10 having locally arranged double-cloth parts 12 encircled with single-cloth parts 14. Preferably, the double- cloth part 12 has a pocket-like opening, a hot melt fiber or water-absorbing fiber is woven into the double-cloth part 12, the double-cloth part 12 has float texture or mock leno weave texture, a part of the single-cloth part 14 has float texture, mock leno weave texture or cord fabric texture or the single-cloth part is colored in a solid color or a patterned color.


Inventors:
NISHIMURA MASAKAZU
NAKAMURA TADAO
Application Number:
JP10877299A
Publication Date:
October 31, 2000
Filing Date:
April 16, 1999
Export Citation:
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Assignee:
NISHIMURA SHOKUFU KOJO KK
International Classes:
A01G1/00; A01G9/02; E02D17/20; (IPC1-7): A01G9/02; A01G1/00; E02D17/20
Attorney, Agent or Firm:
Takayoshi Kusumoto (1 outside)