To provide a coater with a cleaning device in which a very high dryness can be obtained to eliminate an uneven streak caused by a residue of the cleaning chemical even when cleaning with a strong striking force using a low-volatile cleaning chemical, foreign matters that are dried and adhered on a tip end of a slit nozzle can be completely removed by one cleaning operation per each use to improve an yield and shorten a cycle time.
The cleaning device comprises a cleaning head 23 consisting of: a cleaning portion in which two sets of a two-fluid nozzle 10 for ejecting two fluids of a mixture of the cleaning chemical and an inert gas outside the tip end 8 of a slit nozzle, and a liquid break-up nozzle 18 for ejecting the inert gas in an opposite direction to a moving direction of two-fluid nozzle 10 that are disposed in a longitudinal direction of the slit nozzle 1 are closely disposed in parallel to the longitudinal direction of the slit nozzle 1 so as to sandwich the outside of the tip end 8of a slit nozzle therebetween; and an exhaust portion located under the cleaning portion for forcedly exhausting mist waste liquid generated.
YUZAWA ATSUSHI
KOBASHI YASUHIRO
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