Title:
COATING LIQUID FOR FORMING POROUS SILICA FILM
Document Type and Number:
Japanese Patent JP2004002579
Kind Code:
A
Abstract:
To provide a coating liquid which is used for forming porous silica films and can form the porous silica films maintaining low dielectric constants and simultaneously scarcely deteriorating voltage resistance.
This coating liquid for forming the porous silica films comprises a resin obtained by condensing at least one of silane compounds represented by formula (1): Q1a-Si-(OR1)4-a (1) [Q1 is H, F, a 1 to 6C alkyl or an aryl which may be substituted; R1 groups are the same or different, and are each a 1 to 6C alkyl, phenyl or R2CO; R2 is H, a 1 to 6C alkyl or phenyl; (a) is an integer of 0 to 2], an amphoteric surfactant and an organic solvent.
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| WO/2003/014020 | SILICA-BASED PARTICULATES |
Inventors:
YOSHIDA YUJI
Application Number:
JP2002161144A
Publication Date:
January 08, 2004
Filing Date:
June 03, 2002
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C01B33/12; C09D1/00; C09D5/25; C09D7/12; C09D183/02; C09D183/04; H01L21/316; (IPC1-7): C09D1/00; C01B33/12; C09D5/25; C09D7/12; C09D183/02; C09D183/04; H01L21/316
Attorney, Agent or Firm:
Takashi Kuboyama
Toru Nakayama
Masayuki Enomoto
Toru Nakayama
Masayuki Enomoto
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