Title:
被膜形成方法
Document Type and Number:
Japanese Patent JP7161425
Kind Code:
B2
Abstract:
To provide a coating film formation method capable of providing uniform finish excellent in an aesthetic appearance, by exhibiting sufficient permeability and water cutoff performance to an inorganic porous base material.SOLUTION: The present invention is a coating film formation method for forming a coating film on an inorganic porous base material, and includes (I) a process of coating an aqueous covering material of including a synthetic resin emulsion (A) and a water soluble silane compound (B) on the inorganic porous base material, wherein the synthetic resin emulsion (A) is 100 nm or less in an average particle diameter and 2-6 in pH, and including the water soluble silane compound (B) by 0.1-20 pts.wt to 100 pts.wt of a resin solid content of the synthetic resin emulsion (A) and (II) a process of coating a top coating material after drying the aqueous covering material.SELECTED DRAWING: None
Inventors:
Yu Chikamoto
Application Number:
JP2019039142A
Publication Date:
October 26, 2022
Filing Date:
March 05, 2019
Export Citation:
Assignee:
F Consultant Co., Ltd.
International Classes:
B05D7/00; B05D1/36; B05D7/24
Domestic Patent References:
| JP2002256221A | ||||
| JP11147072A | ||||
| JP5138118A | ||||
| JP2000501776A | ||||
| JP10245465A |
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