Title:
被膜形成方法
Document Type and Number:
Japanese Patent JP7307841
Kind Code:
B2
Abstract:
To provide a film formation method which suppresses progress of degradation such as discoloration and cracking caused by an existing film while making use of an uneven pattern and a multicolor pattern of the existing film, and can maintain good appearance over a long period of time.SOLUTION: The present invention is a film formation method for applying a first coating material and a second coating material onto an existing film surface provided on a base material, and forming a new film, wherein the existing film surface has an uneven pattern and/or a multicolor pattern; the first coating material and the second coating material each contain a resin component containing 20 wt.% or more of an alkyl (meth)acrylate (A) having an alkyl group having 3 or more carbon atoms in a resin component, and enables formation of a film having visible light permeability and ultraviolet transmittance of 30% or less; the second coating material contains resin beads; and pigment volume concentration of the first coating material is smaller than that of the second coating material.SELECTED DRAWING: None
Inventors:
Keigo Okamoto
Yusuke Hashimoto
Yusuke Hashimoto
Application Number:
JP2022126768A
Publication Date:
July 12, 2023
Filing Date:
August 09, 2022
Export Citation:
Assignee:
Beck Co., Ltd.
International Classes:
B05D1/36; B05D7/00; B05D7/24; C09D5/32; C09D133/04; E04F13/08
Domestic Patent References:
| JP2017177102A |
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