Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
COATING RESIN COMPOSITION AND PHOTOMASK COATED WITH THE SAME
Document Type and Number:
Japanese Patent JP2002012796
Kind Code:
A
Abstract:

To provide a coating resin composition which is curable even when a radical polymerization inhibit or is attached to the surface of a substrate and can provide a protective film having excellent antistatic ability, hardness, adhesion, UV transparency and water resistance.

The coating resin composition comprises a polymerizable acid phosphate of formula (I): {CH2=C(R1)-C(O) [OCH2C(R2)H]n}mOP(O) (OH)3-m (wherein R1 is a methyl group or the like; R2 is hydrogen or the like; m is an integer of 1 or 2; and n is an integer of 1-8), a silane compound of formula (II): X-Si(Z)(Y)-Y (wherein X is a methacryloxyalkyl group or the like; Y is an alkoxy group; and Z is an alkoxy group or the like) (including, e.g. 3- methacryloxypropyltrimethoxysilane), a metal oxide, and a compound having two or more polymerizable unsaturated double bonds (including, e.g. pentaerythritol tetraacrylate).


Inventors:
FUJIWARA MASAHIRO
Application Number:
JP2000192970A
Publication Date:
January 15, 2002
Filing Date:
June 27, 2000
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TOAGOSEI CO LTD
International Classes:
B82Y30/00; B82Y40/00; C08F2/44; C08F230/02; C08F230/08; C08F290/06; C09D4/00; C09D5/00; G03F1/40; G03F1/48; (IPC1-7): C09D4/00; C08F2/44; C08F230/02; C08F230/08; C08F290/06; C09D5/00; G03F1/14
Attorney, Agent or Firm:
Kojima Kiyoji