Title:
COATING SOLUTION FOR FORMING SILICA-BASED COATING FILM AND SUBSTRATE HAVING COATED FILM
Document Type and Number:
Japanese Patent JP3208040
Kind Code:
B2
Abstract:
PURPOSE: To obtain the subject coating solution giving a coating film having a highly flattened surface and excellent tackiness, resistances against alkali and cracks without attaching of a foreign material thereto by containing a polysilazane having a specific repeating unit and low in low molecular weight components.
CONSTITUTION: This coating solution for forming a silica-based coating film giving a substrate having the coated film wherein unevenness of the coated face is highly flattened, and having excellent tackiness with the coated face, excellent in mechanical strength, resistances to alkali and cracks without attaching of a foreign material is obtained by dissolving 20wt.% polysilazane (expressed by an area ratio of peaks measured by a gel chromatography method) containing ≤10wt.% of a polysilazane having a repeating unit of the formula (R1-R3 are each H, a 1-8C alkyl, alkoxy or allyl) and ≤700 molecular weight in terms of polystyrene, where the total polysilazane has 1000-10000 number- average molecular weight and ≤3.5 dispersibility (weight-average molecular weight/number-average molecular weight), into a solvent such as xylene.
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Inventors:
Nakajima Akira
Toshiro Komatsu
Miki Egami
Toshiro Komatsu
Miki Egami
Application Number:
JP7900895A
Publication Date:
September 10, 2001
Filing Date:
April 04, 1995
Export Citation:
Assignee:
Catalyst Kasei Kogyo Co., Ltd.
International Classes:
C09D183/16; C09D183/00; H05K3/28; (IPC1-7): C09D183/16
Domestic Patent References:
| JP6136130A | ||||
| JP6136323A | ||||
| JP6122852A | ||||
| JP6157989A |
Attorney, Agent or Firm:
Shunichiro Suzuki
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