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Patent Searching and Data


Title:
コバルト錯体及びその製造方法、コバルト含有薄膜及びその製造方法
Document Type and Number:
Japanese Patent JP6855122
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a cobalt complex excellent in a vaporization property, which is useful in manufacturing a cobalt-containing thin film under a condition of not using an oxidizable gas.SOLUTION: The cobalt complex is represented by general formula (1) in the figure, where R, Rand Reach independently represent a hydrogen atom or C1-4 alkyl group, and L represents a C4-10 diene.SELECTED DRAWING: None

Inventors:
Hiroyuki Oike
Teppei Hayakawa
Yasushi Furukawa
Kenichi Tada
Application Number:
JP2017070926A
Publication Date:
April 07, 2021
Filing Date:
March 31, 2017
Export Citation:
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Assignee:
Tosoh Corporation
Sagami Central Chemical Research Institute
International Classes:
C07F19/00; C07F15/06; C23C16/18; H01L21/285
Domestic Patent References:
JP2016166166A
Foreign References:
WO2008111499A1
Other References:
RAZUVAEV, G.A.,Synthesis and mass spectra of derivatives of (η5-cyclopentadienyl)(η4-cyclopentadiene)cobalt,Journal of Organometalic Chemistry,1987年,Vol.346,pp.403-412
RAZUVAEV, G.A. et al.,New derivative of (η,5-cyclopentadienyl)(η4-cyclopentadiene)cobalt,1987年,No.2,p.462
GUTNOV, A.,Tartrate-derived cyclopentadienes for the synthesis of chiral substituted (η5-cyclopentadiene)(η4-cycloocta-1,5-diene)cobalt(I) complexes,Organometallics,2003年,Vol.22,pp.1550-1553
HAMILTON, J.A. et al.,Cobalt(I) olefin complexes: Precursors for metal-organic chemical vapor deposition of high purity cobalt metal thin films,Inorganic Chemistry,2016年,Vol.55,pp.7141-4151
LICHIT, A. I. et al.,Ch-aktivierungsreaktionen an substituierten zirconocenkomplexen und deren verwendung in der katalytischen ethylenpolymerisation,Journal of Organometallic Chemistry,2003年,Vol.684,pp.91-104