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Title:
コークス炉石炭ガス脱硫再生塔排ガス処理プロセス及びシステム
Document Type and Number:
Japanese Patent JP7174163
Kind Code:
B2
Abstract:
Disclosed are a process and a system for treating a tail gas from a desulfurization regeneration tower (1) for coke oven coal gas. After an enriched desulfurization liquid in the desulfurization regeneration tower (1) is oxidized and regenerated, a large amount of oxidizing gas escapes from a gas phase outlet at the top of the tower and enters a gas-liquid separator (8); with a mist-capturing layer (10) being provided at the top of the gas-liquid separator (8), mist droplets captured by the mist-capturing layer (10) are discharged from a liquid phase outlet at the bottom of the gas-liquid separator (8), pressurized by means of a pump (11) and then returned to the desulfurization regeneration tower (1); a separated gas phase, which is a circulating oxidizing gas, escapes from a gas phase outlet at the top of the gas-liquid separator (8) and enters a gas-pressurizing device (9); and the circulating oxidizing gas is first pressurized by the gas-pressurizing device (9) and then mixed with a supplementary oxidizing gas and further mixed with the enriched desulfurization liquid, and then enters the bottom of the desulfurization regeneration tower (1). The oxidizing gas used for the oxidation regeneration of the enriched desulfurization liquid is recycled, so that the system does not realize emission gas generation, thereby finally achieving the aim of no tail gas being emitted from the desulfurization regeneration tower.

Inventors:
Lee, Hao Yang
Lee, Chao
Jao, Quofon
Application Number:
JP2021536145A
Publication Date:
November 17, 2022
Filing Date:
January 06, 2020
Export Citation:
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Assignee:
ACRE Coking & Refractory Engineering Consulting Corporation (Dalian), MCC
International Classes:
B01D53/14; F23G7/06; F27D17/00
Domestic Patent References:
JP52028502A
JP53004774A
JP2004261706A
JP52016868A
JP61255993A
JP54023069A
JP2016120438A
Foreign References:
CN203777878U
CN108325368A
CN108722118A
Attorney, Agent or Firm:
Patent Attorney Corporation Okada International Patent Office