To obtain a photosensitive material good in the stability of the surface when applied, resistant to the variation of drying conditions and low in cost by incorporating a temporary barrier layer consisting of a copolymer having specified monomers as the structural component and a specified copolymer of fluorine-based surfactant into the material.

This photosensitive material has a temporary barrier layer consisting of a copolymer of a fluorine-based surfactant containing a repeating unit expressed by the formula and a copolymer having the following structural components. The components are each one kind of monomers selected from among (A) monoacrylates or monomethacrylates of polyhydric alcohols, (B) ethylenic unsatd. monomers having carboxyl groups, and (C) ethylenic unsatd. monomers except for the groups of (A) and (B) and the monomers being copolymerizable with monomers of (A) and (B). In the formula, R1 is hydrogen atom, chlorine atom or the like, X is a bivalent connecting group, Y is hydrogen atom, an alkyl group or the like, k is an integer 0 to 4, m is 0 to 50, n is 0 to 20, n+m ranges 2 to 50, and x:y ranges 10:90 to 80:20 (mol.%).