Title:
COMPONENT FOR PLASMA TREATMENT APPARATUS AND MANUFACTURING METHOD OF THE COMPONENT
Document Type and Number:
Japanese Patent JP2016065302
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To prevent a particle generated from a flame spray film composed of yttrium fluoride.SOLUTION: A component to be exposed to plasma in a plasma treatment apparatus is provided. This component has a substrate and a coating film. The substrate may be for example made of aluminum or an aluminum alloy. An alumite film may be formed on a surface of the substrate. The coating film is formed on a surface of the substrate or a base including a layer arranged on the substrate by flame spraying of yttrium fluoride. A porosity inside the coating film of the component is 4% or less, and an arithmetic average roughness (Ra) of a surface of the coating film is 4.5 μm or less.SELECTED DRAWING: Figure 2
Inventors:
NAGAYAMA MASAYUKI
MIHASHI YASUSHI
ABUKAWA SHIKO
NAGAI MASAYA
KANAZAWA YOSHINORI
NIYA TETSUYA
MIHASHI YASUSHI
ABUKAWA SHIKO
NAGAI MASAYA
KANAZAWA YOSHINORI
NIYA TETSUYA
Application Number:
JP2015129940A
Publication Date:
April 28, 2016
Filing Date:
June 29, 2015
Export Citation:
Assignee:
TOKYO ELECTRON LTD
TOCALO CO LTD
TOCALO CO LTD
International Classes:
C23C4/04; C23C4/02; C23C4/10; C23C4/12; C23C28/04; H01L21/3065
Domestic Patent References:
| JP2013140950A | 2013-07-18 | |||
| JP2011514933A | 2011-05-12 | |||
| JP2007115973A | 2007-05-10 | |||
| JP2013024142A | 2013-02-04 | |||
| JP2008066707A | 2008-03-21 | |||
| JP2003166043A | 2003-06-13 | |||
| JP2002249864A | 2002-09-06 | |||
| JP2002052651A | 2002-02-19 | |||
| JP2000219574A | 2000-08-08 |
Foreign References:
| WO2009101876A1 | 2009-08-20 | |||
| WO2014018830A1 | 2014-01-30 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Junji Kashiwaoka
Yoshiki Kuroki
Junji Kashiwaoka