Title:
COMPOSITION FOR ETCHING AND ETCHING METHOD
Document Type and Number:
Japanese Patent JP2016162983
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a composition for etching capable of forming a texture of inverse pyramid structure on the surface of a processed object, such as a silicon substrate, by a safe and convenient method at a low cost, with less impact on the environment.SOLUTION: A composition for etching contains a nitrogen-containing aromatic heterocyclic compound and hydrogen fluoride.SELECTED DRAWING: None
Inventors:
KAWAI KENTARO
MORITA MIZUHO
ADACHI KENJI
NAGAI TAKAFUMI
MORITA MIZUHO
ADACHI KENJI
NAGAI TAKAFUMI
Application Number:
JP2015043031A
Publication Date:
September 05, 2016
Filing Date:
March 04, 2015
Export Citation:
Assignee:
DAIKIN IND LTD
UNIV OSAKA
UNIV OSAKA
International Classes:
H01L21/308; H01L31/0236
Attorney, Agent or Firm:
Patent Business Corporation Saegusa International Patent Office