Title:
COMPOSITION FOR FORMING ANTI-REFLECTION FILM, ANTI-REFLECTION FILM AND FORMATION METHOD THEREFOR
Document Type and Number:
Japanese Patent JP2017039928
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a composition for anti-reflection film adding excellent anti-reflection effect and coating strength even onto a hard coat layer, an anti-reflection film and a formation method therefor and an article using the same.SOLUTION: There is provided a compound for forming an anti-reflection film 3 containing an amorphous hollow silica fine particles 4 and a silane compound having an epoxy group. Further preferably there is provided a compound for forming an anti-reflection film 3 containing a polyfunctional alkoxy silane compound. Furthermore there is preferably provided a compound for forming an anti-reflection film 3 containing aluminum tris acetylacetonato as a curing catalyst.SELECTED DRAWING: Figure 1
Inventors:
UENO TOSHIYA
WARABINO HIROAKI
INOUE AKIRA
WARABINO HIROAKI
INOUE AKIRA
Application Number:
JP2016160903A
Publication Date:
February 23, 2017
Filing Date:
August 18, 2016
Export Citation:
Assignee:
NIPPON FINE CHEMICAL CO
International Classes:
C09D183/06; B32B7/02; B32B27/00; C09D5/00; C09D7/12; C09D183/04; G02B1/111; G02B1/14
Domestic Patent References:
JP2005283652A | 2005-10-13 | |||
JP2010186159A | 2010-08-26 | |||
JP2008065110A | 2008-03-21 | |||
JP2005043572A | 2005-02-17 | |||
JP2012214772A | 2012-11-08 | |||
JP2013007929A | 2013-01-10 | |||
JP2013218172A | 2013-10-24 | |||
JP2009280748A | 2009-12-03 |
Attorney, Agent or Firm:
Mitsuo Tanaka
Hiroshi Yamazaki
Tsuyoshi Sato
Hiroshi Yamazaki
Tsuyoshi Sato