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Title:
COMPOSITION FOR FORMING ANTI-REFLECTION FILM, ANTI-REFLECTION FILM AND FORMATION METHOD THEREFOR
Document Type and Number:
Japanese Patent JP2017039928
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a composition for anti-reflection film adding excellent anti-reflection effect and coating strength even onto a hard coat layer, an anti-reflection film and a formation method therefor and an article using the same.SOLUTION: There is provided a compound for forming an anti-reflection film 3 containing an amorphous hollow silica fine particles 4 and a silane compound having an epoxy group. Further preferably there is provided a compound for forming an anti-reflection film 3 containing a polyfunctional alkoxy silane compound. Furthermore there is preferably provided a compound for forming an anti-reflection film 3 containing aluminum tris acetylacetonato as a curing catalyst.SELECTED DRAWING: Figure 1

Inventors:
UENO TOSHIYA
WARABINO HIROAKI
INOUE AKIRA
Application Number:
JP2016160903A
Publication Date:
February 23, 2017
Filing Date:
August 18, 2016
Export Citation:
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Assignee:
NIPPON FINE CHEMICAL CO
International Classes:
C09D183/06; B32B7/02; B32B27/00; C09D5/00; C09D7/12; C09D183/04; G02B1/111; G02B1/14
Domestic Patent References:
JP2005283652A2005-10-13
JP2010186159A2010-08-26
JP2008065110A2008-03-21
JP2005043572A2005-02-17
JP2012214772A2012-11-08
JP2013007929A2013-01-10
JP2013218172A2013-10-24
JP2009280748A2009-12-03
Attorney, Agent or Firm:
Mitsuo Tanaka
Hiroshi Yamazaki
Tsuyoshi Sato