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Title:
COMPOSITION FOR LOCAL USE CONTAINING ACETYLENEDIOL AND USE THEREOF FOR CLEANSING OR REMOVING MAKEUP FROM SKIN, MUCOUS MEMBRANE AND HAIR
Document Type and Number:
Japanese Patent JP2000229810
Kind Code:
A
Abstract:

To obtain a composition for local use having stability, high permissiveness, good makeup removing properties and a good cleansing efficiency by including a specific oxyethylenated compound, acetylenediol and an amphiphlic compound in a medium.

This composition is obtained by including (A) one or more oxyethylenated acetylenediols represented by the formula (R and R' are each a 1-10C alkyl radical; n and m are each O-10) (preferably an oxyethylenated derivative of 2,4,7,9-tetramethyl-5-decyne-4,7-diol) in an amount of 0.01-0.5 wt.% based on the total amount of the composition and (B) preferably 0.001-10 wt.% of at least one preferably nonionic amphiphlic compound (preferably an alkoxylated or a glycerolated alkenyl succiniate) having ≥15 HLB in order to dissolve the ingredient A in a physiologically acceptable medium.


Inventors:
SIMON PASCAL
Application Number:
JP2000032179A
Publication Date:
August 22, 2000
Filing Date:
February 09, 2000
Export Citation:
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Assignee:
OREAL
International Classes:
A61K8/00; A61K8/14; A61K8/30; A61K8/37; A61K8/39; A61K8/81; A61K8/86; A61K8/90; A61Q1/00; A61Q1/10; A61Q1/14; A61Q5/02; A61Q19/00; (IPC1-7): A61K7/00; A61K7/48
Attorney, Agent or Firm:
Masatake Shiga (7 outside)



 
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