組成物、組成物の製造方法および不飽和化合物の製造方法

Japanese Patent JP7396284

B2

The composition comprises a compound (A) represented by general formula (1) and a compound (B) represented by general formula (2), and comprises 0.00002 to 2.0 parts by mass of the compound (B) with respect to 100 parts by mass of the compound (A),        (R₁-COO)n-R₂-(NCO)m     (1)        (R₁-COO)_n-R₂-NHC(=O)NH-R₂-(OCO-R₁)_m     (2)wherein in general formulae (1) and (2), R₁ is an ethylenically unsaturated group having 2 to 7 carbon atoms; R₂ is a (m + n)-valent hydrocarbon group having 1 to 7 carbon atoms and optionally contain an ether group; R₁ and R₂ in the general formula (1) are the same as R₁ and R₂ in the general formula (2); and n and m each represent an integer of one or two.

WO/1989/002884	SUBSTITUTED PHENYLTRIFLUORMETHYLETHERS
JP2000247944	PRODUCTION OF RACEMIC MODIFICATION OF N-CARBONYLAMINO ACID ESTER

Norito Nishimura
Katsutoshi Ohno

JP2020538353A

December 12, 2023

August 16, 2019

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Resonac Co., Ltd.

C07C265/04; C07C231/10; C07C263/10; C07C263/20; C07C269/02; C07C333/04; C07D231/12

JP2016150922A
JP2006232797A
JP64042462A
JP55017357A
JP2002507642A

Shu Oikawa
Norihiko Ara
Tomoo Katsumata
Ryuichiro Majima

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