Title:
COMPOSITION, METHOD FOR PRODUCING CURED FILM AND CURED FILM
Document Type and Number:
Japanese Patent JP2023091679
Kind Code:
A
Abstract:
To provide a composition capable of producing a cured film having excellent pattern formability and alkali resistance.SOLUTION: There is provided a composition comprising an alkali developable compound, a monomer, a thiol and an initiator. The monomer preferably is an acrylic monomer and the thiol preferably contains at least one compound represented by the following formula (C). (wherein, X1 represents an unsubstituted or substituted aliphatic hydrocarbon group having 1 to 40 carbon atoms and having the same number of valence as n1, an unsubstituted or substituted aromatic hydrocarbon group having 6 to 20 carbon atoms or the like, n1 represents an integer of 2 or more and 10 or less.)SELECTED DRAWING: None
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Inventors:
INOUE TAKAHIRO
MAEDA YOSUKE
MAEDA YOSUKE
Application Number:
JP2021206553A
Publication Date:
June 30, 2023
Filing Date:
December 20, 2021
Export Citation:
Assignee:
ADEKA CORP
International Classes:
C08G75/045; G03F7/031; G03F7/027; G03F7/32; G03F7/38
Attorney, Agent or Firm:
Patent Attorney Showa International Patent Office
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