Title:
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
Document Type and Number:
Japanese Patent JP2015168732
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a composition for pattern formation and a pattern-forming method which enable the formation of a pattern that is sufficiently fine and has excellent rectangularity of cross-sectional shape.SOLUTION: This invention provides a composition for pattern formation comprising one or a plurality of polymers capable of forming a phase separation structure through self-assembly, at least one of the one or plurality of polymers having a crosslinkable group in a side chain. Preferably, the crosslinkable group is an oxiranyl group, an oxetanyl group, a tetrahydrofurfuryl group, a vinyl group and a vinyl ether group. Preferably, the composition comprises the one polymer and the polymer is a block copolymer. Preferably, the block copolymer is a diblock copolymer or triblock copolymer. Preferably, the crosslinkable group is included in only one block of the block copolymer.
Inventors:
KOMATSU HIROYUKI
MINEGISHI SHINYA
NAMIE YUJI
NAGAI TOMOKI
MINEGISHI SHINYA
NAMIE YUJI
NAGAI TOMOKI
Application Number:
JP2014043353A
Publication Date:
September 28, 2015
Filing Date:
March 05, 2014
Export Citation:
Assignee:
JSR CORP
International Classes:
C08L101/02; C08F297/02; C08L53/00; H01L21/027
Domestic Patent References:
| JP2011122081A | 2011-06-23 | |||
| JP2001151834A | 2001-06-05 | |||
| JP2014531615A | 2014-11-27 |
Foreign References:
| WO2013036555A1 | 2013-03-14 | |||
| WO2014003023A1 | 2014-01-03 |
Attorney, Agent or Firm:
Hajime Amano
Yoshinori Ikeda
Hiroshi Ogawa
Koji Ishida
Kazuki Kagami
Yoshiaki Negi
Takashi Shiotani
Kenichi Fujinaka
Yoshinori Ikeda
Hiroshi Ogawa
Koji Ishida
Kazuki Kagami
Yoshiaki Negi
Takashi Shiotani
Kenichi Fujinaka