Title:
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
Document Type and Number:
Japanese Patent JP2015180931
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a composition for pattern formation and a pattern-forming method superior in coating property which enable a pattern being sufficiently fine and having a cross-sectional shape that is superior in rectangularity to be formed.SOLUTION: A composition for pattern formation includes one or more polymer(s) capable of forming a phase separation structure through directed self-assembly, and also includes an acid generator that generates an acid upon application of energy, wherein at least one of the one or more polymer(s) includes an acid-labile group in a side chain. Preferably, the one polymer included in the composition for pattern formation is a block copolymer. Preferably, the block copolymer is a diblock copolymer or a triblock copolymer. Preferably, the acid-labile group is included in only one block in the block copolymer.
Inventors:
KOMATSU HIROYUKI
MINEGISHI SHINYA
NAMIE YUJI
NAGAI TOMOKI
MINEGISHI SHINYA
NAMIE YUJI
NAGAI TOMOKI
Application Number:
JP2015043018A
Publication Date:
October 15, 2015
Filing Date:
March 04, 2015
Export Citation:
Assignee:
JSR CORP
International Classes:
G03F7/039; C08F297/02; G03F7/40
Domestic Patent References:
| JP2012108369A | 2012-06-07 | |||
| JP2014172468A | 2014-09-22 | |||
| JP2015064572A | 2015-04-09 | |||
| JP2014172461A | 2014-09-22 | |||
| JP2015065432A | 2015-04-09 |
Foreign References:
| WO2011039847A1 | 2011-04-07 |
Attorney, Agent or Firm:
Hajime Amano
Yoshinori Ikeda
Hiroshi Ogawa
Koji Ishida
Kazuki Kagami
Kenichi Fujinaka
Yoshinori Ikeda
Hiroshi Ogawa
Koji Ishida
Kazuki Kagami
Kenichi Fujinaka