Title:
ルテニウム除去用組成物
Document Type and Number:
Japanese Patent JP7219061
Kind Code:
B2
Abstract:
The present invention addresses the problem of providing a remover composition which can sufficiently remove ruthenium (Ru) remaining on substrates and can be inhibited from evolving RuO4 gas. The remover composition, which is for removing ruthenium remaining on substrates, has a pH at 25° C. of 8 or higher and includes one or more pH buffer ingredients.
Inventors:
Kazuki Kashiwagi
Takuo Owada
Takuo Owada
Application Number:
JP2018214179A
Publication Date:
February 07, 2023
Filing Date:
November 14, 2018
Export Citation:
Assignee:
Kanto Chemical Co., Ltd.
International Classes:
H01L21/304; C11D7/08; C11D7/10; C11D7/18
Domestic Patent References:
| JP2006173454A | ||||
| JP2009016854A |
Foreign References:
| WO2016068183A1 |
Attorney, Agent or Firm:
Kiyokazu
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