Title:
ざ瘡によって誘発される炎症および真皮マトリックス分解酵素に対して用いる組成物および方法
Document Type and Number:
Japanese Patent JP2004515460
Kind Code:
A
Abstract:
Acne-affected skin has been found to be accompanied by the presence of matrix-degrading enzymes such as MMPs and neutrophil elastase, induction of neutrophils, and a reduction in procollagen biosynthesis. This invention treats scarring and inflammation accompanying acne by administering, topically or systemically, at least one of (i) an inhibitor of the matrix degrading enzymes and (ii) a cytokine inhibitor that alleviates inflammation and thus also alleviate neutrophil infiltration. Alleviating the matrix degradation and renormalizing procollagen biosynthesis allows for reduced inflammation and better natural repair of acne-affected skin. Inhibiting cytokines alleviates induction of MMPs in resident skin cells, and also alleviates inflammation with its concommitant induction of neutrophils from the blood stream bringing MMPs and elastase into the acne lesion. Dimishing the presence of matrix-degrading enzymes in the acne lesion reduces imperfect repair of the skin and thus decreases scarring in acne-affected skin.
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Inventors:
Volheath, John Jay.
Kwang, Sewon
Fisher, Gary Jay.
Kwang, Sewon
Fisher, Gary Jay.
Application Number:
JP2001585747A
Publication Date:
May 27, 2004
Filing Date:
May 22, 2001
Export Citation:
Assignee:
THE REGENTS OF THEUNIVERSITY OF MICHIGAN
International Classes:
A61K8/22; A61K8/67; A61K31/07; A61K31/203; A61K31/327; A61K31/41; A61K31/573; A61K31/65; A61K45/06; A61P5/44; A61P17/10; A61P29/00; A61K45/00; A61P31/04; A61P39/06; A61P43/00; A61Q19/00; (IPC1-7): A61K45/00; A61K31/203; A61K31/327; A61K31/573; A61K31/65; A61K45/06; A61P5/44; A61P17/10; A61P29/00; A61P31/04; A61P39/06; A61P43/00
Attorney, Agent or Firm:
Yosuke Goto
Kenho Ikeda
Kenho Ikeda