Title:
COMPOUND, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2019218335
Kind Code:
A
Abstract:
To provide a compound, a resin, and a resist composition capable of producing a resist pattern having good line edge roughness (LER).SOLUTION: The compound is represented by formula (IA) or formula (IB), and the resin and the resist composition contain a structural unit derived from the compound. (Formula IA): CH=C(-R)-X-L(-OR)(-OR)(-0R). (Formula IB): CH=C(-R)-X-L(-X-C(-R)=CH)(-OR)(-0R). [Rand Reach represent H or a methyl group; Xand Xeach represent -C(=O)O- or the like; Lrepresents a substituted/unsubstituted C1-48 hydrocarbon group; and R, Rand Reach represent a C2-4 cyclic hydrocarbon group containing one O, which may have a saturated hydrocarbon group.]SELECTED DRAWING: None
Inventors:
HIGO MUTSUKO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2019097028A
Publication Date:
December 26, 2019
Filing Date:
May 23, 2019
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D305/06; C08F220/18; C08F220/26; C08K5/42; C08L33/06; G03F7/004; G03F7/038; G03F7/039; G03F7/20
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Other References:
BIOMACROMOLECULES, vol. 17(8), JPN6023002038, 2016, pages 2701 - 2709, ISSN: 0004970362
AZERBAIDZHANSKII KHIMICHESKII ZHURNAL, vol. (1), JPN6023002039, 2015, pages 44 - 49, ISSN: 0004970363
FATIPEC CONGRESS, vol. 17th(1), JPN6023002040, 1984, pages 255 - 274, ISSN: 0004970364
AZERBAIDZHANSKII KHIMICHESKII ZHURNAL, vol. (3), JPN6023002041, 2008, pages 146 - 150, ISSN: 0004970365
AZERBAIDZHANSKII KHIMICHESKII ZHURNAL, vol. (1), JPN6023002039, 2015, pages 44 - 49, ISSN: 0004970363
FATIPEC CONGRESS, vol. 17th(1), JPN6023002040, 1984, pages 255 - 274, ISSN: 0004970364
AZERBAIDZHANSKII KHIMICHESKII ZHURNAL, vol. (3), JPN6023002041, 2008, pages 146 - 150, ISSN: 0004970365
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation