Title:
COMPOUND, RESIN, RESIST COMPOSITION AND PRODUCTION METHOD OF RESIST PATTERN
Document Type and Number:
Japanese Patent JP2013006832
Kind Code:
A
Abstract:
To provide a resist composition from which a resist pattern can be produced in a superior feature.
The compound is expressed by formula (I). A resin having a structural unit derived from the compound and the resist composition containing the resin are also disclosed. In the formula, R1 represents a hydrogen atom or a methyl group; and ring W1 represents a 3-34C sultone ring optionally having a substituent.
Inventors:
ICHIKAWA KOJI
SHIMADA MASAHIKO
SHIMADA MASAHIKO
Application Number:
JP2012117113A
Publication Date:
January 10, 2013
Filing Date:
May 23, 2012
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D327/04; C08F28/02; G03F7/039
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation