Title:
COMPOUND, RESIN, RESIST COMPOSITION AND PRODUCTION METHOD OF RESIST PATTERN
Document Type and Number:
Japanese Patent JP2014156586
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a compound and a resin used for a resist composition from which a negative resist pattern with excellent line edge roughness (LER) can be produced.SOLUTION: The compound is expressed by formula (I). In formula (I), Rrepresents a hydrogen atom, a halogen atom or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom; Rand Reach independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; Rrepresents an alkyl group having 1 to 6 carbon atoms, and Rand Rmay be integrated together with -C-O- bonded to these groups to form a heterocycle having 2 to 8 carbon atoms; and Arepresents a single bond or-A-X-(A-X)-, where Aand Aeach independently represent an alkanediyl group having 1 to 6 carbon atoms, Xand Xeach independently represent -O-, -CO-O- or -O-CO-, a represents 0 or 1, and * represents a bond to an oxygen atom.
Inventors:
YOSHIDA ISAO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2013255837A
Publication Date:
August 28, 2014
Filing Date:
December 11, 2013
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08F20/28; C07C69/757; C07D307/00; C07D307/33; C07D313/10; G03F7/038; G03F7/039
Domestic Patent References:
| JP2013007020A | 2013-01-10 | |||
| JP2013007031A | 2013-01-10 | |||
| JP2009235184A | 2009-10-15 | |||
| JP2000098612A | 2000-04-07 | |||
| JP2000029219A | 2000-01-28 |
Foreign References:
| WO2005113617A1 | 2005-12-01 | |||
| WO2012046607A1 | 2012-04-12 |
Attorney, Agent or Firm:
Nakayama 亨
Toru Sakamoto
Toru Sakamoto