Title:
COMPOUND, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022173129
Kind Code:
A
Abstract:
To provide a resist composition from which a pattern having good CD uniformity can be produced.SOLUTION: There are provided: a compound represented by a formula (I); and a resist composition containing the compound. [Ring W represents an alicyclic hydrocarbon group containing an ether bond; L1 represents a single bond or an optionally substituted alkanediyl group; R1 represents *-R10, *-CO-O-R10 or the like; R10 represents a group of a formula (IC); R2 represents *-L1-O-R1, a group represented by a formula (R2-1) or the like; L4 represents an optionally substituted alkanetriyl group; Rab1 and Rab2 each represent a hydrogen atom, an alkyl group or the like; and R3 represents a halogen atom or the like.]SELECTED DRAWING: None
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Inventors:
KITA YUJI
USAGAWA DAN
ICHIKAWA KOJI
USAGAWA DAN
ICHIKAWA KOJI
Application Number:
JP2022075880A
Publication Date:
November 17, 2022
Filing Date:
May 02, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/039; C07D407/14; C07D493/04; C09K3/00; G03F7/004; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation