Title:
化合物、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7129272
Kind Code:
B2
Abstract:
To provide a compound and a resist composition capable of producing a resist pattern with excellent CD uniformity (CDU).SOLUTION: The compound is represented by formula (I), and the resist composition contains the compound. [In the formula, Rrepresents a group represented by formula (R-1) or formula (R-2); R-Reach represent an alkyl group, an alicyclic hydrocarbon group, a group composed of a combination thereof, or the like; Rand Reach independently represent a hydrogen atom or a hydrocarbon group; Rrepresents a hydrocarbon group or the like; Xrepresents an oxygen atom or a sulfur atom; * represents a bond; and Rrepresents an optionally substituted hydrocarbon group, provided that -CH- contained in the hydrocarbon group may be substituted with -O- or the like.]SELECTED DRAWING: None
Inventors:
Tatsuro Masuyama
Araki incense
Koji Ichikawa
Araki incense
Koji Ichikawa
Application Number:
JP2018153687A
Publication Date:
September 01, 2022
Filing Date:
August 17, 2018
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/64; C07C309/71; G03F7/004; G03F7/20
Domestic Patent References:
| JP2000330289A | ||||
| JP2000310852A | ||||
| JP2013008022A | ||||
| JP2013182191A | ||||
| JP2014010269A |
Foreign References:
| WO2003025676A1 |
Other References:
Paul Mueller et al.,Chimia,1987年,Vol.41, No.11,p.399-401
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation