Title:
化合物、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7133391
Kind Code:
B2
Abstract:
To provide a compound and a resist composition capable of producing a resist pattern with excellent line edge roughness (LER).SOLUTION: The compound is represented by formula (I), and the resist composition contains the compound. [In the formula (I), Rrepresents a C1-12 fluorinated hydrocarbon group; and Rrepresents an optionally substituted C1-24 hydrocarbon group, provided that -CH- contained in the hydrocarbon group may be substituted with -O-, -S-, -CO- or -SO-.]SELECTED DRAWING: None
Inventors:
Tatsuro Masuyama
Takahiro Yasue
Koji Ichikawa
Takahiro Yasue
Koji Ichikawa
Application Number:
JP2018153684A
Publication Date:
September 08, 2022
Filing Date:
August 17, 2018
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/004; C07C309/64; C07C309/71; G03F7/20
Domestic Patent References:
| JP2014026102A | ||||
| JP2005084584A | ||||
| JP2013182191A |
Other References:
Shinji Ando et al.,Journal of Photopolymer Science and Technology,2002年,Vol.15, No.4,p.559-568
T. Fujigaya et al.,Journal of Photopolymer Science and Technology,2002年,Vol.15, No.4,p.643-654
Zhilian Zhou et al.,J. Am. Chem. Soc.,2006年,Vol.128, No.39,p.12963-12972
DATABASE REGISTRY (STN) RN 1808499-63-9,[online],2015年09月29日,[Retrieved on 2022.02.01]
DATABASE REGISTRY (STN) RN 1864469-85-1,[online],2016年02月11日,[Retrieved on 2022.02.01]
DATABASE REGISTRY (STN) RN 1862678-85-0,[online],2016年02月09日,[Retrieved on 2022.02.01]
DATABASE REGISTRY (STN) RN 1206680-56-9,[online],2010年02月17日,[Retrieved on 2022.02.01]
Bartosz Gorski et al.,European Journal of Organic Chemistry,2018年,Vol.2018, No.15,p.1774-1784, Supporting Information
T. Fujigaya et al.,Journal of Photopolymer Science and Technology,2002年,Vol.15, No.4,p.643-654
Zhilian Zhou et al.,J. Am. Chem. Soc.,2006年,Vol.128, No.39,p.12963-12972
DATABASE REGISTRY (STN) RN 1808499-63-9,[online],2015年09月29日,[Retrieved on 2022.02.01]
DATABASE REGISTRY (STN) RN 1864469-85-1,[online],2016年02月11日,[Retrieved on 2022.02.01]
DATABASE REGISTRY (STN) RN 1862678-85-0,[online],2016年02月09日,[Retrieved on 2022.02.01]
DATABASE REGISTRY (STN) RN 1206680-56-9,[online],2010年02月17日,[Retrieved on 2022.02.01]
Bartosz Gorski et al.,European Journal of Organic Chemistry,2018年,Vol.2018, No.15,p.1774-1784, Supporting Information
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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