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Patent Searching and Data


Title:
COMPOUND SEMICONDUCTOR
Document Type and Number:
Japanese Patent JP2013157587
Kind Code:
A
Abstract:

To solve a problem of a large influence on practical use of an element substrate such as SiC for a high-voltage driver element, which is caused by a large number of crystal faults and a large amount of leakage current.

In a compound semiconductor of a present embodiment, by forming a single-crystal compound semiconductor such as a SiC film on an insulation film on a substrate to form a Schottky diode as an element substrate, an electric field from the substrate, and an electric field from a conductor formed in a groove which is formed as a trench in a part of the single-crystal semiconductor and which has oxide films on side walls, and an electric field from a field plate provided in a surface layer of the element through an insulation film ease an electric field applied to an anode of the Schottky diode. Accordingly, an influence of a crystal fault of the single-crystal compound semiconductor such as SiC is decreased.


Inventors:
KATO MITSUHARU
Application Number:
JP2012029936A
Publication Date:
August 15, 2013
Filing Date:
January 28, 2012
Export Citation:
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Assignee:
MTEC KK
International Classes:
H01L29/47; H01L21/02; H01L27/12; H01L29/41; H01L29/872