Title:
化合物
Document Type and Number:
Japanese Patent JP6981767
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a compound and a resin suitably used for a resist composition that can produce a resist pattern having excellent CD uniformity.SOLUTION: The present invention provides a compound represented by formula (I), and a resin and a resist composition containing a structural unit derived from it [where Ris a hydrogen atom or a methyl group; Ris a hydrocarbon group; Rand Rare each an aliphatic hydrocarbon group; Xand Xindependently represent an oxygen atom or a sulfur atom; Xis a divalent saturated hydrocarbon group that may contain a fluorine atom; Ais-A- or-A-X-(A-X)-A-: * is a bond to C(R)(R); Aand Aindependently represent a single bond or a divalent hydrocarbon group; Aand Aare a divalent hydrocarbon group; Xand Xindependently represent -O-, -CO-O-, -O-CO- or -O-CO-O-: a is 0 or 1].SELECTED DRAWING: None
Inventors:
Tatsuro Masuyama
Okada Natsuki
Koji Ichikawa
Okada Natsuki
Koji Ichikawa
Application Number:
JP2017084475A
Publication Date:
December 17, 2021
Filing Date:
April 21, 2017
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D317/24; C07C309/17; C07D321/06
Domestic Patent References:
| JP2000509075A | ||||
| JP2016090868A | ||||
| JP2000162772A | ||||
| JP2011039498A | ||||
| JP2012107204A | ||||
| JP2017122780A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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