Title:
化合物及びその製造方法
Document Type and Number:
Japanese Patent JP6713112
Kind Code:
B2
Abstract:
The invention relates to a compound and a production method thereof, and provides a compound providing a photosensitive composition with excellent sensitivity and a manufacturing method of the compound. The method comprises introducing, into a carbazole ring or a fluorene ring in the oxime ester compound having a carbazole ring or a fluorene ring as a main skeleton, groups respectively having an electron attractive group an aryl group, a heteroaryl group, an aryl group containing more that one kinds of chain aliphatic hydrocarbon groups each having one or more kinds selected from carbon-carbon double bonds and carbon-carbon triple bonds, or a combination thereof. As the electron attractive group, a nitro group or a cyano group is preferable.
Inventors:
Keisuke Tadokoro
Shioda Dai
Makoto Harihara
Takaki Ichioka
Toshiharu Shimamaki
Shioda Dai
Makoto Harihara
Takaki Ichioka
Toshiharu Shimamaki
Application Number:
JP2016089896A
Publication Date:
June 24, 2020
Filing Date:
April 27, 2016
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
Daito Chemix Co., Ltd.
Daito Chemix Co., Ltd.
International Classes:
C07C251/66; C07C249/12; C07C319/20; C07C323/47; C07D209/86
Domestic Patent References:
| JP2009042751A |
Foreign References:
| WO2014050738A1 |
Attorney, Agent or Firm:
Masayuki Masabayashi