Title:
CONDUCTIVE POLYMER COMPOSITION, COVERED PRODUCT, AND PATTERN FORMATION METHOD
Document Type and Number:
Japanese Patent JP2023078552
Kind Code:
A
Abstract:
To provide a conductive polymer composition excellent in filterability and deposition property of a flat film on an electron beam resist, showing excellent antistatic property also in electron beam lithography, and minimizing an influence of an acid that diffuses by the film, and capable of suitably using in an electron beam resist lithography antistatic film excellent also in peelability.SOLUTION: (A) A conductive polymer composition comprises a polyaniline-based conductive polymer having a repeating unit represented by the following general formula (1) and a specific polymer having a pyrrolidinium salt structure moiety. (In the formula, R1 to R4 represent a hydrogen atom, an acidic group, a hydroxy group, an alkoxy group, a carboxyl group, a nitro group, a halogen atom, or a hydrocarbon group.)SELECTED DRAWING: None
Inventors:
NAGASAWA TAKAYUKI
HATAKEYAMA JUN
HATAKEYAMA JUN
Application Number:
JP2021191721A
Publication Date:
June 07, 2023
Filing Date:
November 26, 2021
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
C08L79/00; C08G73/00; C08L39/00; C08L101/14; G03F7/038; G03F7/039; G03F7/11; G03F7/20
Attorney, Agent or Firm:
Mikio Yoshimiya
Toshihiro Kobayashi
Toru Otsuka
Toshihiro Kobayashi
Toru Otsuka