Title:
CONTROL DILUTION FLOW IN CRITICAL ENVIRONMENT
Document Type and Number:
Japanese Patent JP2016211844
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a control dilution fluid flow pattern.SOLUTION: Fluid supply devices 11 are constituted to control a pattern of fluid flow in a critical room. The critical room includes a critical region covering contamination. A first fluid supply nozzle is constituted to provide a first fluid supply injection 20 for providing first fluid flow toward a substantial center of a critical region. A second fluid nozzle is constituted to provide a second fluid supply injection 21 for providing second fluid flow toward a peripheral side of a room. A propulsion power of the first fluid supply injection and a propulsion power of the second fluid supply are adjusted in such a manner that a substantial center of the critical region is flowed by the first flow and immersion of the second flow to the substantial center of the critical region is substantially prevented. In accordance with another preferred embodiment, HVAC system and method are argued together with some features of the device.SELECTED DRAWING: Figure 6
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Inventors:
KIM HAGSTROEM
Application Number:
JP2016096355A
Publication Date:
December 15, 2016
Filing Date:
May 12, 2016
Export Citation:
Assignee:
HALTON OY
International Classes:
F24F7/06; A61G10/00; F24F7/007; F24F7/10; F24F11/02; F24F13/068; F24F13/26
Domestic Patent References:
| JP2012507321A | 2012-03-29 | |||
| JPH048028U | 1992-01-24 | |||
| JP2011226770A | 2011-11-10 |
Foreign References:
| US6048499A | 2000-04-11 |
Attorney, Agent or Firm:
Hayashi Ichiyoshi
Tetsuo Shiba
Takuya Saito
Tetsuo Shiba
Takuya Saito