Title:
CONTROL MIXING, AND CHEMICAL MATERIAL PREPARING DEVICE AND METHOD ACCOMPANIED WITH CONCENTRATION FEED BACK AND ADJUSTMENT
Document Type and Number:
Japanese Patent JP3210646
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a device for preparing a high purity chemical mixture with the min. storage quantity of the high purity chemical materials.
SOLUTION: These device and method are for preparing the high purity chemical mixture 68 by mixing the high purity chemical materials 16, 18 are provided with the circulation, the purification 56 and the detection 58 of the chemical materials between the mixing of the high purity chemical materials and the storage for use, and are particularly a high purity chemical mixture preparing device and method for a semiconductor material processing plant, for example, a semiconductor production equipment for processing a silicon wafer.
Inventors:
James Pratt Monroe
Richard Lynton Samsal
Bruce Herman Greena Wald
Richard Lynton Samsal
Bruce Herman Greena Wald
Application Number:
JP19118099A
Publication Date:
September 17, 2001
Filing Date:
July 06, 1999
Export Citation:
Assignee:
Air Products and Chemicals, Inc.
International Classes:
B01F13/10; B01F15/04; G05D11/02; B01F3/04; G05D11/13; H01L21/306; (IPC1-7): B01F15/04; G05D11/02
Domestic Patent References:
| JP8252442A | ||||
| JP7204481A | ||||
| JP61118127A | ||||
| JP58146527U |
Attorney, Agent or Firm:
Takashi Ishida (4 others)