Title:
固体から昇華した蒸気の流れの制御
Document Type and Number:
Japanese Patent JP5457816
Kind Code:
B2
Abstract:
The service lifetime of an ion source is enhanced or prolonged by the source having provisions for in-situ etch cleaning of the ion source and of an extraction electrode, using reactive halogen gases (F or Cl), and by having features that extend the service duration between cleanings. The latter include accurate vapor flow control, accurate focusing of the ion beam optics, and thermal control of the extraction electrode that prevents formation of deposits or prevents electrode destruction. An apparatus comprised of an ion source for generating dopant ions for semiconductor wafer processing is coupled to a remote plasma source which delivers F or Cl ions to the first ion source for the purpose of cleaning deposits in the first ion source and the extraction electrode. These methods and apparatus enable long equipment uptime when running condensable feed gases such as sublimated vapor sources, and are particularly applicable for use with so-called cold ion sources. Methods and apparatus are described which enable long equipment uptime when decaborane and octadecarborane are used as feed materials, as well as when vaporized elemental arsenic and phosphorus are used, and which serve to enhance beam stability during ion implantation.
Inventors:
Thomas N. Horse Key
Robert W. Millgate The Third
Robert W. Millgate The Third
Application Number:
JP2009286994A
Publication Date:
April 02, 2014
Filing Date:
December 17, 2009
Export Citation:
Assignee:
Semequip, Incorporated
International Classes:
C23C14/48; C23C16/455; C23C16/448; H01J7/24; H01J27/20; H01J37/08; H01J37/317; H01L21/265; H01J
Domestic Patent References:
| JP1225117A | ||||
| JP4232275A | ||||
| JP2007521398A |
Foreign References:
| WO2002043803A1 |
Other References:
J.J. SULLIVAN et al.,Mass flow measurement and control of low vapor pressure sources,J. Vac. Sci. Technol. A,1989年,7(3),pp. 2387-2392
Attorney, Agent or Firm:
Hidesaku Yamamoto
Takaaki Yasumura
Natsuki Morishita
Takaaki Yasumura
Natsuki Morishita