Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
COPOLYESTER RESIN COMPOSITION, METHOD FOR MANUFACTURING THE SAME, AND BIAXIALLY ORIENTED FILM COMPRISING THE SAME
Document Type and Number:
Japanese Patent JP2010031139
Kind Code:
A
Abstract:

To provide a copolyester resin composition that provides a film which has both excellent dimensional stability against change in temperature or humidity and excellent surface roughness and is extremely preferable as a high-density magnetic storage medium when formed into a biaxially oriented film.

The copolyester resin composition comprises: an aromatic dicarboxylic acid residue represented by following formulae (I) -(O)C-R2-OR1O-R2-C(O)- and (II) -(O)C-R4-C(O)- (in formula (I), R1 is a 2-10C alkylene; and R2 is a 2,6-naphthalenediyl; and in formula (II), R4 is a phenylene or a naphthalenediyl); and a 2-4C alkylene glycol residue, wherein a reactant of a phosphorus compound represented by formula (A) with a metallic compound is contained in a copolyester in which a rate of the aromatic dicarboxylic acid residue represented by formula (I) is 5 mol% or mroe but less than 50 mol% (in formula (A), R6 represents alkyl which is a 1-12C hydrocarbon group, aryl or benzyl; and R7 and R8 are each independently hydrogen, alkyl which is a 1-12C hydrocarbon group, aryl or benzyl).


Inventors:
ISHIDERA TOSHIO
KISHINO TOMOYUKI
TOGASAKI JUNICHI
Application Number:
JP2008194446A
Publication Date:
February 12, 2010
Filing Date:
July 29, 2008
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TEIJIN LTD
International Classes:
C08L67/02; C08G63/78; C08J5/18; C08K5/5317
Attorney, Agent or Firm:
Hideko Mihara