Title:
COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION USING THE SAME
Document Type and Number:
Japanese Patent JP2002201226
Kind Code:
A
Abstract:
To provide a radiation-sensitive resin composition which exhibits high transmission of various radiations, especially of far-ultraviolet rays represented by KrF excimer laser, and is excellent in sensitivity, resolution, adhesion to substrates, and dry etching resistance; and a copolymer used therefor.
The copolymer has at least one acid-decomposable group, repeating units represented by formula (1) (wherein R1 is H or methyl; R2 is H, methyl or hydroxyl; and n is an integer of 0-2), and repeating units represented by formula (2) (wherein R3 to R10 are each independently H or a monovalent organic group). The radiation-sensitive resin composition contains the copolymer and a radiation-sensitive acid generator.
Inventors:
NAGAI TOMOKI
GOTO KENTARO
SHIMOKAWA TSUTOMU
GOTO KENTARO
SHIMOKAWA TSUTOMU
Application Number:
JP2000400932A
Publication Date:
July 19, 2002
Filing Date:
December 28, 2000
Export Citation:
Assignee:
JSR CORP
International Classes:
G03F7/039; C08F212/14; C08F232/08; C08K5/00; C08L25/18; C08L45/00; (IPC1-7): C08F212/14; C08F232/08; C08K5/00; C08L25/18; C08L45/00; G03F7/039
Attorney, Agent or Firm:
Shuji Iwamiya