COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION

Japanese Patent JP2005330369

A

To provide a radiation-sensitive resin composition giving a reduced fluctuation range of resist pattern width, having high sensitivity to radiation and exhibiting excellent etching resistance, and a copolymer suitably employable for the resin composition.

The copolymer comprises a unit represented by formula (1) (wherein R1 is a hydrogen atom or a monovalent organic group; and n is a natural number of 1-3) and a unit represented by formula (2) (wherein R2 is a hydrogen atom or a monovalent organic group; and a and b are each a natural number of 1-3). The radiation-sensitive resin composition comprises the copolymer.

WO/2008/084781	PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE FILM, PERMANENT MASK RESIST, AND METHOD FOR PRODUCING THE SAME
JP2749031	VINYL 4-HYDROXYBENZAL-VINYL ALCOHOL-VINYL ACETATE COPOLYMER, VINYL 4-T-BUTOXYCARBONYLOXYBENZAL-VINYL ALCOHOL-VINYL ACETATE COPOLYMER, VINYL 4-T-BUTOXYCARBONYLOXYBENZAL-VINYL 4-HYDROXYBENZAL-VINYL ALCOHOL-VINYL ACETATE COPOLYMER, THEIR PRODUCTION AND PHOTORESIST PRODUCT
JP6644406	Alkali-soluble resin and photosensitive resin composition

NAGAI TOMOKI
TSUJI TAKAYUKI
GOTO KENTARO

JP2004149280A

December 02, 2005

May 19, 2004

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JSR CORP

G03F7/033; C08F212/14; G03F7/039; H01L21/027; (IPC1-7): C08F212/14; G03F7/033; G03F7/039; H01L21/027

Ippei Watanabe
Koji Kikawa
Takeshi Higuchi

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