Title:
CORRECTION DEVICE FOR MASK PATTERN
Document Type and Number:
Japanese Patent JPS5479568
Kind Code:
A
Abstract:
PURPOSE:To obtain a highly-precise pattern by correcting the pattern of a photo mask over an observation of the matched position relation between a pattern close to a correction part and another pattern superposed optically in any other process or the same process. CONSTITUTION:Reference and corrected photo masks 10 and 11 are mounted on the stages which can move in the XY direction and rotate independently. Then, one pattern on mask 11 is irradiated with one beam from observation light source 12 by way of condenser lens 13, mirror 14, prism 15, half mirror 17, and object lens 18. In the same way, the other pattern on mask 10 is irradiated with the other beam from light source 12 by way of condenser lens 24, mirror 25, prism 26, and object lens 27. Next, althrough mask 11 is irradiated with the beam from exposing light source 30 via variable aperture 34, reflected images of masks 10 and 11 are observed at eye lens 23 by way of prism 20, and mirrors 21 and 22 by using prisms 15 and 26 again, thereby adjusting stages.
Inventors:
IWAMA IKUO
Application Number:
JP14740477A
Publication Date:
June 25, 1979
Filing Date:
December 07, 1977
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
G01N21/88; G01N21/956; G03F1/00; G03F1/72; H01L21/027; H01L21/302; (IPC1-7): G01N21/32; H01L21/302