Title:
COSMETIC FOR HYPERSENSITIVE SKIN
Document Type and Number:
Japanese Patent JP2003335658
Kind Code:
A
Abstract:
To provide a preparation which does not develop transient irritation while having microbial contamination resistance even without using a general- purpose preservative such as parabens.
This cosmetic for hypersensitive skin is obtained by adding (1) 1,2-hexylene glycol and (2) an antimicrobial phospholipid to cosmetic. Linoleamidopropyl PG-dimonium chloride phosphate, cocoamidopropyl PG- dimonium chloride phosphate and sodium coco PG-dimonium chloride phosphate, or the like, are preferably exemplified as the antimicrobial phospholipid. The cosmetic as a preferable form does not contain the conventional preservative such as methylparaben. A polyhydric alcohol except the 1,2-hexylene glycol may be cited as a preferable arbitrary component.
Inventors:
MATSUBARA KENKICHI
FUTAKI KIYOKO
KATAGIRI RUMI
FUTAKI KIYOKO
KATAGIRI RUMI
Application Number:
JP2002142233A
Publication Date:
November 25, 2003
Filing Date:
May 17, 2002
Export Citation:
Assignee:
POLA CHEM IND INC
International Classes:
A61K8/00; A61K8/06; A61K8/30; A61K8/34; A61K8/60; A61K31/047; A61K38/00; A61P17/16; A61Q19/00; (IPC1-7): A61K7/48; A61K7/00; A61K31/047; A61K38/00; A61P17/16
Previous Patent: MINERAL WATER
Next Patent: LIPASE ACTIVITY INHIBITOR AND COSMETIC CONTAINING THE SAME
Next Patent: LIPASE ACTIVITY INHIBITOR AND COSMETIC CONTAINING THE SAME